| 专利名称 | Dual beamsplitting element based excimer laser pulse stretching device | 申请号 | US201514925197 | 专利类型 | US | 公开（公告）号 | US9537280(B2) | 公开（授权）日 | 2017.01.03 | 申请（专利权）人 | 中国科学院光电技术研究所 | 发明（设计）人 | Li Bincheng;Wang Qiang;Han Yanling | 主分类号 | H01S3/223 | IPC主分类号 | H01S3/223;H01S3/081;H01S3/00;H01S3/225 | 专利有效期 | Dual beamsplitting element based excimer laser pulse stretching device 至Dual beamsplitting element based excimer laser pulse stretching device | 法律状态 | 说明书摘要 | The present invention discloses a dual beamsplitting element based excimer laser pulse stretching device comprising two beam splitting elements and one confocal resonator. The first beamsplitting element splits incident laser beam into two beams, one beam enters the confocal resonator, generates a certain time delay and then is incident on the second beamsplitting element, and the second beam is directly incident on the second beamsplitting element. The second beamsplitting element further splits each of the incident laser beams into two beams, one of the two beams enters the confocal resonator, generates a certain time delay and is returned back to the first beamsplitting element to be further split, and the other of the two beams is combined with other beams which are direct outputs after being split by the beamsplitting elements or being optically delayed by the confocal resonator to form a stretched output beam. The present invention may effectively enhance the efficiency of the pulse stretching, decrease the peak power of the stretched beam, and increase the lifetime of optical elements used in the excimer laser photolithography systems. |
1、源头对接，价格透明
2、平台验证，实名审核
3、合同监控，代办手续
4、专员跟进，交易保障