| 专利名称 | Apparatuses and methods for detecting wave front abberation of projection objective system in photolithography machine | 申请号 | US201113884028 | 专利类型 | US | 公开（公告）号 | US9046791(B2) | 公开（授权）日 | 2015.06.02 | 申请（专利权）人 | 中国科学院长春光学精密机械与物理研究所 | 发明（设计）人 | Xiang Yang;Yu Changsong | 主分类号 | G01B11/02 | IPC主分类号 | G01B11/02;G03F7/20;G02B5/18;G01M11/02 | 专利有效期 | Apparatuses and methods for detecting wave front abberation of projection objective system in photolithography machine 至Apparatuses and methods for detecting wave front abberation of projection objective system in photolithography machine | 法律状态 | 说明书摘要 | Apparatus and methods for detecting wave front aberration of a projection objective lens in a photolithography machine are disclosed. The apparatus comprises: a light source system configured to generate an illuminating beam; a spatial filter configured to receive the illuminating beam and generate ideal spherical wave; a splitter plate arranged downstream to the spatial filter at a predetermined angle with respect to an optical axis of the spherical wave and having a transflective film being applied on a surface thereof; the projection objective lens configured to receive a beam from the splitter plate and generate an output beam; a spherical mirror configured to reflect the output beam from the projection objective lens to the projection objective lens, light passing through the projection objective lens being reflected by the splitter plate; and an interferometer configured to receive light reflected by the splitter plate and measure the wave front aberration of the projection objective lens. |
1、源头对接，价格透明
2、平台验证，实名审核
3、合同监控，代办手续
4、专员跟进，交易保障