High-purity tellurium dioxide single crystal and manufacturing method thereof

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专利名称 High-purity tellurium dioxide single crystal and manufacturing method thereof 申请号 US201013262209 专利类型 US 公开(公告)号 US8480996(B2) 公开(授权)日 2013.07.09 申请(专利权)人 中国科学院上海硅酸盐研究所 发明(设计)人 GE ZENGWEIZHU YONGWU GUOGINGYIN XUEJITANG LINYAOZHAO HANBINGU LIZHE 主分类号 C01B19/04 IPC主分类号 C01B19/04;C30B11/02;C30B15/00 专利有效期 High-purity tellurium dioxide single crystal and manufacturing method thereof 至High-purity tellurium dioxide single crystal and manufacturing method thereof 法律状态 说明书摘要 A high-purity tellurium dioxide (TeO2) single crystal and its manufacturing method are provided. The method comprises the following procedures: firstly performing a first single crystal growth, and then dissolving the resulting single crystal again, thereafter adding a precipitation agent to form powder, and finally performing a second single crystal growth of as-prepared powder to obtain the high purity single crystal. The TeO2 single crystal prepared according to present invention is of high purity, especially with a content of radioactive impurities such as U and Th decreased to a level of 10-13 g/g.

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