| 专利名称 | Metal optical grayscale mask and manufacturing method thereof | 申请号 | US20100960418 | 专利类型 | US | 公开（公告）号 | US8133642(B2) | 公开（授权）日 | 2012.03.13 | 申请（专利权）人 | 国家纳米科学中心 | 发明（设计）人 | GUO CHUANFEILIU QIANCAO SIHAIWANG YONGSHEN | 主分类号 | G03F1/00 | IPC主分类号 | G03F1/00;G03F7/00 | 专利有效期 | Metal optical grayscale mask and manufacturing method thereof 至Metal optical grayscale mask and manufacturing method thereof | 法律状态 | 说明书摘要 | A metal optical grayscale mask includes a layer of metal film which is deposited on transparent substrate, and different transparency pattern which is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or random pattern. The grayscale is within 3.0 OD-0.05 OD. The thickness of the metal film is 5-100 nm. A manufacturing method of the metal optical grayscale mask includes that the selected transparent substrate is rinsed by the general semiconductor rinse process, the metal film is deposited on the transparent substrate then different transparency pattern is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or the random pattern. The grayscale mask is low in price, antistatic electricity performance is good, the resolution can surpass optical diffraction limit. The manufacturing method is simple. There is a wide band application for micro-optical components and large-scale production of micro-electro-mechanical systems. |
1、源头对接，价格透明
2、平台验证，实名审核
3、合同监控，代办手续
4、专员跟进，交易保障